In-situ patterning: selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A.

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Materials Research Society, Jul 13, 1990 - Technology & Engineering - 496 pages
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Contents

THEIR
3
SURFACE CHEMISTRY OF DIMETHYLALUMINUM HYDRIDE
21
MECHANISM OF CHROMIUM DEPOSITION FROM CrCO6 BY UV LASER
27
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In-Situ Patterning: Selective Area Deposition and Etching ...
The MRS symposium on In-Situ Patterning: Selective Area Deposition and Etching brought together a wide selection of microfabrication technologies and ...
stinet.dtic.mil/ oai/ oai?verb=getRecord& metadataPrefix=html& identifier=ADA229588

Fraunhofer-Publica
Laser temperature interlevel sio2 layers by photoinduced processing. : Sigmund, H.; Klumpp, A.; Springholz, G. Bernhardt, af ; Materials Research Society ...
publica.fraunhofer.de/ starweb/ servlet.starweb?path=pub0.web& search=PX-21615

Phys. Rev. B 50, 12183 (1994): Mostoller et al. - Edge-dislocation ...
Edge-dislocation intersections in diamond cubic crystals. Mark Mostoller, mf Chisholm, and Theodore Kaplan; Solid State Division, Oak Ridge National ...
link.aps.org/ doi/ 10.1103/ PhysRevB.50.12183

Chemical Vapor Deposition of Aluminum
Chapter. 2. Chemical Vapor Deposition. of. Aluminum. Michael G. Simmonds. Wayne L. Gladfelter. Department of Chemistry. University of Minnesota ...
doi.wiley.com/ 10.1002/ 9783527615858.ch2