Optical Thin Films, Volume 2262SPIE--the International Society for Optical Engineering, 1994 - Coatings |
Contents
Some comparisons in the application of EndHall and Cold Cathode ion sources in | 14 |
Ratecontrolled synthesis of compositionmodulated metal oxide thin films 226203 | 22 |
Directcurrent magnetron sputtering for optical coatings 226241 | 41 |
Copyright | |
21 other sections not shown
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Common terms and phrases
absorption angle of incidence applications bandpass filters bandwidth beam birefringence cell chamber characterization coefficient Cold Cathode cold mirror damage threshold defects deposition process deposition rate diagnostic coating dielectric electrical electron energy evaporation film materials film thickness fluorine function fused silica gas flow glass hardening holograms increase Indium Tin Oxide interface laser layer thickness low index LQWS magnetron magnetron sputtering mask measured metal method microstructure Mueller matrix multilayer nitrogen optical coatings optical constants optical properties optical system Optical Thin Films optimization oxide films oxygen parameters PECVD plasma polarization polymer range reflection holograms reflector refractive index reststrahlen sample scattering sccm shift shown in Figure shows silicon silicon dioxide SiO2 SnO2 solar spectral spectrum SPIE Vol sputter deposition stoichiometry structure substrate surface target technique temperature TEOS thermal transmittance typical vacuum values wavelength Wavelength nm