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Introduction and Outline
8 other sections not shown
a-axis atomic oxygen barrier basal plane oxygen base electrode behavior bulk film c-axis Chapter cm-1 mode Co-SNS junction Co-YBCO Co-YBCO films content and order coulomb blockade crystal structure CuO2 planes cuprate decrease demonstrated deposition device diffraction diffusion dopant electromigration experiments fabrication Figure following a series following electromigration grain boundary junction high temperature superconducting HTSC IcRn product IcRn versus increase indicates induced Josephson junctions laser layer level of oxygenation microbridge O2 anneal O2/O3 anneals observed optimally oxygenated Ortho orthorhombic oxidation oxygen content oxygen deficient oxygen loss oxygen vacancies ozone annealing parameters partial pressure phase photoresist Phys portrayed in Fig presented in Fig pressure of atomic pulsed laser deposition Raman modes Raman spectra Raman spectroscopy Resistivity versus temperature room temperature RT characteristics sample scale series of electromigration substrate superconducting tetragonal thermal thin film transition transport properties vacancy plume variation wave number YSCMO