Effect of Oxygen and Nitrogen Interactions on Friction of Single-crystal Silicon CarbideNational Aeronautics and Space Administration, Scientific and Technical Information Office, 1978 - Friction - 19 pages |
Common terms and phrases
1.3 pascals adsorbed oxygen film Adsorbed-oxygen film adsorption and ion argon argon-sputter-cleaned surface Auger spectrum Average coefficients Basal plane bombarded with oxygen bombardment Sputter cleaning carbon peak cleaning Oxygen-ion bombardment coefficient of friction disk and rider effects of oxygen Electron energy emission spectroscopy exposed to gaseous film in sliding films of oxygen friction behavior friction experiments friction for silicon gaseous oxygen hesion ion bombardment ion-bombarded nitrogen film Kanazawa University Lewis Research Center load molecular orbitals NITROGEN INTERACTIONS Number of passes Oxygen adsorption oxygen and nitrogen Oxygen-ion bombardment Sputter pascals 10 µm reacted oxide film reacted-oxide film rider Sputter cleaning silicon carbide 0001 silicon carbide disk Silicon carbide rider silicon carbide surface silicon carbide-to-silicon carbide silicon carbide-to-titanium silicon peak single-crystal silicon carbide sliding contact sorbed Sputter cleaning Oxygen-ion sputter-cleaned silicon carbide sputter-cleaned surfaces strain gage surface fig surface with adsorbed surfaces of silicon titanium surface titanium to oxygen vacuum chamber valence band