Laser and Particle-beam Chemical Processes on Surfaces: Symposium Held November 29-December 2, 1988, Boston, Massachusetts, U.S.A.
Materials Research Society, 1989 - Technology & Engineering - 649 pages
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
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SOME RECENT RESULTS OF FUNDAMENTAL STUDIES OF BEAMINDUCED
ION BEAM PROCESSING OF OPTICAL MATERIALS
ATOMICSCALE MODELING OF LOWENERGY IONSOLID PROCESSES
69 other sections not shown
ablation absorption adsorbed AlGaAs amorphous Appl atoms carbon chemical chemical vapor deposition chlorine crystal current density depth desorbed desorption diffusion dissociation dye laser electron emission epitaxial etch rate excimer laser excitation experimental exposure Figure fluence flux formation function GaAs gas phase growth rate heating hydrogen increase induced intensity interaction irradiation ISBN laser ablation laser beam laser fluence laser irradiation laser power laser pulse laser-induced layer LCVD Lett mass material measured melting metal micrograph molecules morphology observed obtained optical oxide oxygen particles pattern peak photochemical photodeposition photodissociation photolysis photon Phys PI film plasma polyimide polymer pressure Proc produced radiation reaction region resistance sample scan semiconductor sendust shown in Fig shows silicon species spectra spectroscopy spectrum sputtering structure substrate substrate temperature superconducting surface Symp technique Technol thermal thickness thin films threshold Torr vapor velocity wafer wavelength width