Laser-assisted Processing II: 13-14 March 1990, The Hague, the NetherlandsLucien D. Laude |
Contents
FUNDAMENTAL PROCESSES | 1 |
CERAMICS AND POLYMERS | 49 |
A Antonetti France | 59 |
Copyright | |
4 other sections not shown
Common terms and phrases
ablation absorption Appl ArF laser atoms bonds calculated ceramics Chem chemical Chemical Vapor Deposition cm² CO2 laser compound configuration crystallites decrease deposition detected detector diameter dipoles distance dye laser emission equation excimer laser excited experimental field Figure film thickness flux formation heat increase induced intensity interaction interface ionization irradiation Knudsen layer KrF excimer laser laser beam laser cladding laser fluence laser irradiation laser power laser pulses laser radiation laser spot laser-induced Lett mass material mbar measured melt pool metal mJ/cm² molecules monomer nitride nitrogen observed obtained optical oxide parameters particles peak photodiode photolysis photon photoresist Phys plasma plume polariton polyimide polymer polymerization pressure quartz reaction resonance sample scattering sensor response shown in Fig signal silane silicide silicon simulations spectra spectroscopy spectrum stoichiometric substrate substrate temperature surface polariton target technique thermal thin values vapor velocity w/wp wavelength