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actuator adaptive optics angle applied attenuation beam calculated cavity cell chip correction deﬁned deformable mirror density device diffraction dose effect electrical electrode electron Engineering etch experimental exposure fabrication ﬁber ﬁeld ﬁgure ﬁlm ﬁlter ﬁrst ﬁt ﬁxed ﬂow frequency grating IEEE immersion lithography increase laser laser diode layer lens linewidth lithography mask materials measured mechanical membrane MEMS method micro microelectromechanical systems micromachining micromirror mirror module MOEMS nanowire optical optimization paper parameters pattem photomask photon photoresist Phys pixels planarization PMGI PMMA polarization polymer proﬁle pulse QSPR ratio reﬂectance refractive index resin resist resonance sample scanner scanning sensor shown in Fig shows signiﬁcant silicon simulation solution speciﬁc spectral SPIE stress structures substrate surface target technique temperature thermal thickness tion University values voltage wafer wavelength width z-pinch