Fundamentals of Electrochemical Deposition (Google eBook)

Front Cover
John Wiley & Sons, Aug 11, 2006 - Science - 368 pages
1 Review
Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields."
-Corrosion on the First Edition of Fundamentals of Electrochemical Deposition

From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge.

The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including:
* Metal-solution interphase
* Charge transfer across an interphase
* Formation of an equilibrium electrode potential
* Nucleation and growth of thin films
* Kinetics and mechanisms of electrodeposition
* Electroless deposition
* In situ characterization of deposition processes
* Structure and properties of deposits
* Multilayered and composite thin films
* Interdiffusion in thin film
* Applications in the semiconductor industry and the field of medicine

This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material.

Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.
  

What people are saying - Write a review

We haven't found any reviews in the usual places.

Related books

Contents

1 Overview
1
2 Water and Ionic Solutions
7
3 Metals and Metal Surfaces
25
4 MetalSolution Interphase
41
5 Equilibrium Electrode Potential
55
6 Kinetics and Mechanism of Electrodeposition
77
7 Nucleation and Growth Models
113
8 Electroless Deposition
139
13 Characterization of Metallic Surfaces and Thin Films
221
14 In Situ Characterization of Deposition
237
15 Mathematical Modeling in Electrochemistry
249
16 Structure and Properties of Deposits
273
17 Electrodeposited Multilayers
289
18 Interdiffusion in Thin Films
307
19 Applications in Semiconductor Technology
321
20 Applications in the Fields of Magnetism and Microelectronics
333

9 Displacement Deposition
169
10 Effect of Additives
177
11 Electrodeposition of Alloys
199
12 Metal Deposit and Current Distribution
209
21 Frontiers in Applications The Field of Medicine
345
Index
355
Copyright

Common terms and phrases

References to this book

All Book Search results »

References from web pages

Milan Paunovic and Mordechay Schlesinger, Fundamentals of ...
Fundamentals of Electrochemical Deposition. John Wiley & Sons: New York (1998). 301 pages,. £45±50. The number of texts solely devoted to electrodeposition ...
www.springerlink.com/ index/ JQ7703Q5G524V888.pdf

FUNDAMENTALS OF ELECTROCHEMICAL DEPOSITION
Fundamentals of electrochemical deposition / Milan Paunovic, Mordechay. Schlesinger. — 2nd ed. p. cm. Includes bibliographical references and index. ...
doi.wiley.com/ 10.1002/ 0470009403.fmatter

Semiconductor catalytic layer and atomic layer deposition thereof ...
Fundamentals of Electrochemical Deposition, John Wiley & Sons, Inc. © 1998, pp. 148-149. ;Milan Paunovic and Mordechay Schlesinger. ...
www.freepatentsonline.com/ 6479902.html

【求助】Fundamentals of Electrochemical Deposition 博研联盟-中国 ...
书名: Fundamentals of Electrochemical Depositio .
www.bylm.net/ forum/ read.php?tid=80030

Electrochemical Deposition
Modern Electroplating (4th edition), M. Schlesinger and M. Paunovic (editors), Wiley, New York, 2000. Fundamentals of Electrochemical Deposition, ...
cobweb.ecn.purdue.edu/ ~mdasilva/ Electrodeposition.shtml

Livraria Alfa
Fundamentals of Electrochemical Deposition is an ideal graduate-level textbook for students of electrochemistry and related areas. ...
www.livrariaalfa.com.br/ verproduto.php?id=3034

Globalbook
Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of ...
www.globalbookstore.com.mx/ detalles.php?ISBN=0471712213

博客來書籍館>FUNDAMENTALS OF ELECTROCHEMICAL DEPOSITION 2/E
FUNDAMENTALS OF ELECTROCHEMICAL DEPOSITION 2/E. 作者:PAUNOVIC; 出版社:全華科技; 出版日期: 2006年11月01日; 語言: 英文 ISBN: 0471712213; 裝訂: 精裝 ...
www.books.com.tw/ exep/ prod/ booksfile.php?item=0010348053

Fundamentals of Electrochemical Deposition
textbooksrus.com Save 50-90% off New & Used Books and Textbooks. Absolute lowest prices! Free Shipping. Fast Delivery
www.textbooksrus.com/ search/ bookdetail/ ?isbn=9780471712213

FUNDAMENTALS OF ELECTROCHEMICAL DEPOSITION 2/E---新絲路網路書店 ...
提供愛書人經鬆買書的好選擇,新絲路網路書店是值得您信賴的網路書店
www.silkbook.com/ content/ 4th.asp?goods_ser=kk0162157

About the author (2006)

MILAN PAUNOVIC, PhD, was, until recently, a research staff member in the Electrodeposition Technology Department at the IBM T. J. Watson Research Center. He began work on electrochemical metal deposition in 1961 at the University of Pennsylvania, Philadelphia, and subsequently worked on metal deposition at Reynolds Metals, Kollmorgen, and Intel. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and Modern Electroplating (both by Wiley), has edited four symposia proceedings volumes of The Electrochemical Society, published forty-one papers, and holds seven patents.

MORDECHAY SCHLESINGER, PhD, is a professor in the Department of Physics at the University of Windsor, Ontario, Canada. He is a former associate editor of both the Journal of The Electrochemical Society and Electrochemical and Solid State Letters. He is a fellow of the American Physical Society and The Electrochemical Society. He has also been named a General Motors Academic Research Fellow. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and of Modern Electroplating. He has published over 120 research papers and holds four patents.

Bibliographic information