Scanning Electron Microscopy Systems and Applications 1973,Institute of Physics (Great Britain). Electron Microscopy and Analysis Group |
Contents
The carbon field emitter as an electron gun source | 12 |
A comparison between LaB6 and W electron emitters in a | 28 |
An ultrahigh vacuum scanning electron microscope with Auger analysis facilities | 42 |
Copyright | |
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Common terms and phrases
aberration alloy analysis angle aperture astigmatism atomic number Auger electron axis backscattered beam current beam voltage Bloch wave calculated carbon cathode coating coefficient coils crystal CTEM curve deflection density detector diffraction pattern dislocation display distance distortion elastic electron beam electron gun electron probe emitter energy equation experimental field emission field emission gun film function geometry inelastic scattering instrument Joy D C Kossel lattice lenses line scan magnetic magnetic lens magnification martensite measurements metal method microanalysis micrograph mode normal objective lens observed obtained operation optical oxide p-n junction parameters peak photomultiplier Phys plane plate probe current probe diameter Proc pulse quantitative ratio SACP sample scanning electron microscope scattered electrons screen secondary electron shown in figure shows silicon specimen chamber spectrometer spherical aberration stage STEM Stereoscan substrate technique temperature thickness tilt transmission electron microscope tungsten vacuum voltage Wehnelt X-ray