Specimen preparation for transmission electron microscopy of materials III: symposium held December 5-6, 1991, Boston, Mass., U.S.A.
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FIBXTEMFOCUSSED ION BEAM MILLING FOR TEM SAMPLE
PRECISION ION POLISHING SYSTEMA NEW INSTRUMENT
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1992 Materials Research acetone alloy analysis area of interest argon Bravman ceramic cleaved composite cross section cross-section cutting damage diameter diamond lapping film dimpler dimpling edge electron transparent epoxy etching Fe-Zn couple FIB system fibers FIBXTEM final polishing flatting tool focused ion beam G.W. Bailey Gatan glass insert glass slide grain grid grinding heating high resolution holder indentation interface ion beam thinning ion gun ion milling ion polishing ion-milling ISBN low angle magnification Materials Research Society mechanical metal method micrograph micron microscope microstructural microtomed milling rate mounted mucilage optical particle performed phase PIPS planar plane polishing powder Proc procedure produced region removed resin Ron Anderson rotation sample preparation semiconductor shown in Figure shows side silicon specimen post specimen preparation specimen surface specimen thickness sputtering step structure substrate Symp temperature thin area thin film Transmission Electron Microscopy tungsten ultramicrotomed ultramicrotomy ultrasonic wafer wheel YBCO