Laser-assisted Fabrication of Thin Films and Microstructures: 17-19 August 1993, Québec, Canada |
Contents
Growth of 105K BiPbSrCa₂Cu3O10 films on MgO by the pulsedlaser deposition technique | 30 |
transient behavior study of laser decomposition process 204534 | 34 |
Direct laser writeon exposure of thick film screens 204510 | 47 |
Copyright | |
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Common terms and phrases
absorption annealing Appl applications atomic CdTe chemical copper density deposition rate devices diamond dielectric diffraction direct writing electron emulsion energy epitaxy excimer laser exciton experimental exposure fabrication Figure films deposited fluence focused formation GaAs growth III-V integrated circuits interface J.J. Dubowski J/cm² laser ablation laser beam laser fluence laser power laser pulses laser writing laser-induced layer LB writing Lett LiNbO3 film lines material mbar measured metal metalorganic microns microoptical elements microstructures nickel optical oxide oxygen pattern phase photoresist Phys plasma polyimide precursor pressure pyrolysis ratio reaction resist sample scanning semiconductor sensor shown in Fig shows silicide silicon silicon nitride SiO2 spectra SPIE spin-coated spot stoichiometry structure substrate substrate temperature surface target technique Technol thermal thickness thin films TiO2 channels Torr tungsten vacuum wafers waveguide wavelength width writing speed writing system X-ray X-ray diffraction YBCO µm/s