Optical/laser Microlithography, Volume 1927, Parts 1-2SPIE--the International Society for Optical Engineering, 1993 - Lasers |
Contents
Simulating the stitching performance of flatpaneldisplay steppers 192743 | 533 |
Overlay distortions in waferscale integration lithography 192744 | 543 |
ADVANCED OPTICAL SYSTEMS | 567 |
Copyright | |
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Common terms and phrases
aerial image alignment amorphous silicon Aquatar array beam CD control chrome component conventional cost of ownership Deep UV defect defocus depth of focus developed device diffraction distortion dose DRAM edge effect Electron etalon etch rate excimer laser experimental exposure latitude field film filter function grating i-line illumination increase isolated line layer lens light lines and spaces linewidth variation lithography manufacturing maximum measured method Micrascan Microlithography micron mix-and-match modulation moiré signal negative resist numerical aperture obtained optical optimized optimum overlay parameters partial coherence particle performance phase modulation phase-shifting mask photolithography photoresist physical-optics plane polarization position pupil reflection resist thickness resolution reticle scalar SEMATECH shifter shifting mask shown in figure shows simulation spectral SPIE spin coated step stepper stitching errors substrate surface technique test wafer topography values vector wavelength width window