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Interaction and Kinetics
7 other sections not shown
ablation absorbed absorption adsorbed annealing applications argon laser atoms band bonds c-Si C02 laser chemical reactions coefficient conduction band CW heating CW laser defined density desorption dielectric diffusion discussed dissociation effects electronic energy enhanced evaporation example excimer laser excitation fluence formation GaAs gas phase grown growth rates impurities incident increase initial insulating intensity interaction interface irradiation laser annealing laser beam laser induced laser processing laser pulses laser radiation laser-assisted lattice material mechanisms melting metals methods modes molecules Nd:YAG nitride nm/min nm/pulse nm/s nucleation occur optical oxidation rate oxide layers oxygen pattern photochemical photodeposition photon photoresist Phys plasma possible present pressure produced properties pulsed laser pyrolytic reaction rate reactive recent regime sample surface semiconductors shown SiH4 silicon dioxide silicon nitride species sticking coefficient structure substrate techniques temperature thermal thickness thin films tion ture various vibrational wavelength