Laser Processing of Thin Films and Microstructures: Oxidation, Deposition, and Etching of Insulators |
Contents
Introduction | 1 |
Experimental Considerations | 100 |
LaserAssisted Oxidation and Nitridation | 134 |
Copyright | |
6 other sections not shown
Other editions - View all
Laser Processing of Thin Films and Microstructures: Oxidation, Deposition ... Ian W. Boyd Limited preview - 2013 |
Laser Processing of Thin Films and Microstructures: Oxidation, Deposition ... Ian W. Boyd No preview available - 1987 |
Laser Processing of Thin Films and Microstructures: Oxidation, Deposition ... Ian W. Boyd No preview available - 2011 |
Common terms and phrases
ablation absorbed adsorbed annealing Appl applications argon laser atoms band bonds c-Si Chem chemical reactions CO2 laser conduction band CW heating D.J. Ehrlich density desorption device dielectric diffusion discussed dissociation electronic energy enhanced evaporation example excimer laser excitation fluence formation GaAs gas phase grown growth rates impurities incident increase initial insulating intensity Interactions interface irradiation laser annealing laser applications laser beam laser induced laser processing laser pulses laser radiation laser-assisted lattice Lett material mechanisms melting metals modes molecules Nd:YAG nitride nm/min nm/pulse nm/s occur optical oxidation rate oxide layers oxygen photochemical photodeposition photon photoresist Phys plasma present pressure produced properties pulsed laser R.M. Osgood reaction rate recent regime sample surface semiconductors shown silicon dioxide silicon nitride SiO2 solid species Springer sticking coefficient structure substrate T.F. Deutsch techniques Technol temperature thermal thickness thin films tion ture various vibrational wavelength