Characterization of optical materials
Focuses on how surface morphology, microstructure, and chemical bonding influence the optical response of a material. Illuminates methods used to characterize thin films, multilayer structures and modified surfaces. Appendices include summaries of characterization techniques specific to optical materials.
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Characterization in Compound Semiconductor Processing
Yale Strausser,Gary E. McGuire
Limited preview - 2009
CHARACTERIZATION OF SURFACE ROUGHNESS
CHARACTERIZATION OF THE NEARSURFACE REGION
MICROSTRUCTURE OF OPTICAL MATERIALS
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alloy amorphous analysis analytical techniques Appl atomic bandgap beam chemical bonding coefficient composition compressive stress crystalline CVD diamond defects density Depth profiling determine dielectric diffraction electron microscopy elements ellipsometry emission energy film stress fluence frequency function glass grain impurities incident infrared Instrument cost interface intrinsic stress ion implantation irradiation J. M. Bennett laser laser damage Lateral resolution lattice layer light measurements mechanical profiler metal methods microstructure multilayer coatings multilayer optical multilayer optical coatings Nomarski microscope nondestructive obtained optical coatings optical materials optical profilers optical properties optical response optical surfaces oxide parameters peak phase photon Phys polarization polishing probe pulsed Raman scattering Raman spectroscopy range reflection refractive index sample surface scanning scratches semiconductors sensitive shown in Figure silica silicon SiO2 specific spectra spectrum sputtering stoichiometry structure substrate surface roughness temperature tensile stress thermal thickness thin films tion transmission electron microscopy types wavelength X-ray XTEM