Excimer Lasers: Applications, Beam Delivery Systems, and Laser Design : 18-19 November 1992, Boston, MassachusettsJames A. Greer |
Contents
Comparison of largearea pulsedlaser deposition approaches 183503 | 3 |
EXCIMER LASER PHOTOLITHOGRAPHY AND RELATED MATERIALS | 51 |
Characterization setup and control of a manufacturing laser ablation tool and process | 62 |
Copyright | |
13 other sections not shown
Common terms and phrases
ablation process ablation tool absorption aperture Appl applications birefringence CaF2 capacitors carbon catadioptric cathode color center formation color centers composition damage decrease deep-UV deposition rate diode discharge electron emission energy density etalon etch rate Excimer Grade excimer laser exposure Figure film deposited film thickness fluorescence fluorine fused silica HDPG hole homogenizer illumination imaging impurities increase intensity irradiation KrF laser large-area laser ablation laser fluence laser induced laser pulse lens lenses Lett line-narrowed lithography mask material measured microns mixture module numerical aperture observed obtained off-axis output oxygen parameters particulate diameter pattern Photolithography photoresist Phys plasma plume center polyimide PTFE pulsed laser deposition radiation rastered repetition rate resolution reticle sample shows spectra substrate substrate temperatures superconducting target surface technique Technology thickness profile thin films Torr typical uniformity vacuum voltage wafer wavelength wavelength stabilization XeCl laser YBCO