Homogeneous reactions of hydrocarbons, silane, and chlorosilanes in radiofrequency plasmas at low pressures
Reuven Avni, United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch
National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1984 - Technology & Engineering - 10 pages
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3.5 volX SiCl4 adding hydrogen alumina amount of free Argon concentration Aron Inspektor Beer Sheva C3H6 plasma C3H6-argon plasma C3Hg-argon charge transfer reaction chlorosilane monomers deposition rate dissociation and polymerization Electron Paramagnetic Resonance enhanced EPR spectra figure form solid formation of polymerized gas stream gases graphite Grounded Substrates H and G Homogeneous Reactions hydrocarbon plasma hydrogen or ammonia inhibition intensity in position intensity of free ion-molecule interaction ion-molecule mechanism Ionel Rosenthal kinetics Lewis Research Center Matheson maximum energy density monomer dissociation NASA normalized EPR intensity Nuclear Research Center order of magnitude overall reaction rate partial pressure Penning ionization Plasma processing plasma system polymerized species positions H positive ions radical concentration radical interaction Radiofrequency rate constant k0 rate-determining step reaction rate constant reaction rate k0 Reactions of Hydrocarbons reactor Research Center Negev Reuven Avni rf coil rf plasma SiCl SiCl4-argon plasma silicon silicon nitride torr total gas pressure Uzi Carmi