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Ealing Schwarzschild microscope using 5060nm illumination from a laser plasma EUV source
Plasma xray source of various materials produced by compact solid state lasers 201503
Highperformance xray spectroscopy of plasma microsources 201505
absorption amplifier angle annealing aperture approximately array atomic number Bragg angle calculated capillary arrays carbon cell conversion efficiency crystal detector diameter diffraction electron temperature emitted excimer laser experimental experiments exposure Figure film filter focusing foil gas puff target heating incidence ionization ions irradiated KrF laser Laboratory laser energy laser intensity laser plasma source laser plasma x-ray laser produced laser pulse laser system laser-produced plasma layer maximum measured microchannel plate detector Mo/Si multilayer molybdenum monochromatic nucleosome obtained particulates photons Phys picosecond pinch plasma pinhole plasma source plasma x-ray source PMMA produced plasma radiative range ratio rays reemission reflectivity region Rutherford Appleton Laboratory Schwarzschild shot shows simulations spatial resolution spectral brightness spectrograph spectrometer spectroscopy spectrum SPIE streak camera structure surface SXCM SXPL tape target target material thermal thickness transmission water window wavelength x-ray emission x-ray imaging x-ray laser x-ray lithography x-ray microscopy x-ray optics zone plate