MOEMS Display and Imaging Systems: 28-29 January 2003, San Jose, California, USAHakan Urey |
Contents
ARRAYBASED MOEMS DEVICES AND APPLICATIONS | 1 |
Design and fabrication of microlens and spatial filter array by selfalignment 498503 | 26 |
Highresolution maskless lithography by the integration of microoptics and point array | 37 |
Copyright | |
20 other sections not shown
Common terms and phrases
aberration adaptive optics alignment amplitude aperture applications beam bonding capacitance chip CMOS coil components curve deflection deformable mirror deposited developed device diffraction Digital Micromirror Device display driving voltage Electro Mechanical Systems electrode electrostatic etch eutectic feedthroughs Flexible micromirror frame function glass n1 hermetic IEEE integrated laser lens light source linear magnetic maskless lithography maskless lithography system membrane mirror MEMS MEMS scanner microlens microlens array micromachined micromirror array microsystems mirror plate MLSFA MOEMS nonlinear operation optical system oscillation oxide parameters pattern performance photoresist pixel polyimide Proceedings of SPIE projector resolution response ribbons scan angle scanning mirror Sensors and Actuators shown in Figure signal silicon nitride simulation Solid-State Sensors spatial filter spatial filter array spatial light modulators SPIE Vol structure surface switching techniques temperature thickness thin film torsional Transducers voltage wafer wavefront wavelength