MOEMS Display and Imaging Systems: 28-29 January 2003, San Jose, California, USAHakan Urey |
Contents
ARRAYBASED MOEMS DEVICES AND APPLICATIONS | 1 |
Design and fabrication of microlens and spatial filter array by selfalignment 498503 | 26 |
Highresolution maskless lithography by the integration of microoptics and point array | 37 |
Copyright | |
20 other sections not shown
Common terms and phrases
aberration acoustic sensor actuator adaptive optics alignment aluminum amplitude aperture applications ball lens beam bonding capacitance chip CMOS coil components curve deformable mirror deposited developed device diffraction display driving voltage electrode electrostatic elements equation etch feedthroughs function glass hinge IEEE insulation integrated laser layer lens light source linear magnetic maskless lithography Maskless Lithography System measured mechanical membrane mirror MEMS MEMS scanner metal Micro Scanning Mirror microlens micromachined microsystems mirror plate MOEMS nodes nonlinear operation optical system oscillation oxide package parameters pattern performance photoresist pixel plane polyimide Proceedings of SPIE resolution resonant frequency response ribbons scan angle Sensors and Actuators shown in Figure shows silicon nitride simulation spatial filter array spatial light modulators SPIE Vol stress structure substrate surface switching techniques temperature thickness torsional torsional springs trenches unimorph voltage wafer wavefront wavelength