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Union Cemetery, Redwood City, California: The People, Their Lives, Their ...
John G. Edmonds
No preview available - 2009
Masks for MarkleDyson optics 208701
Flexure of photomasks in manufacturing and application 208708
CORE 2564 process optimization with the APTCON 4045 208709
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aerial image alignment alternating PSM aperture APTCON artifact attenuating PSM automated binary masks blank calibration chromium clamping contact hole coordinate patch cost database defocus deposition develop dose dry etch e-beam edge effects Etec Systems excimer laser exposure feature focus grid halftone-rim i-line illumination image contrast inspection intensity isolated laser layer Leica lens lithography manufacturing mask fabrication measurement MEBES method metrology micron micron technology microscope optical optical lithography optimized parameters pattern pellicle performance phase error phase shift masks phase-shifting Photolithography photomask photoresist pinhole pixel plate positioning accuracy printability probe proximity effects quartz bump defect raster reduced repair resist resolution reticle rim PSM scanning SEMATECH sensitivity shifter shown in Figure simulation sizes SPIE stepper substrate SXPL technique TEST MASK thickness throughput tool transmission defects wafer wavelength wet etched