Mechanisms of surface and microstructure evolution in deposited films and film structures: symposium held April 17-20, 2001, San Francisco, California, U.S.A.
A wide variety of materials systems and deposition strategies have been developed to produce epitaxial and polycrystalline thin films. In particular, controlling the morphology and microstructure of metal films at the nanometer and/or micron scale has become crucial for applications such as giant magneto-resistive devices, contacts and diffusion barriers in integrated circuits and photovoltaics, and multilayer X-ray mirrors. This volume focuses on the interactions between different mechanisms of microstructure evolution and film-growth conditions. Two sections of the volume, including a joint effort with Symposium R, "Morphology and Dynamics of Crystal Surfaces in Molecular and Colloid Systems, highlight the fundamental mechanisms of epitaxial growth.
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2001 Materials Research acetylacetonate activation energy adatom AES signals Al(Cu amorphous annealing Appl atoms beam biaxial texture c-axis calculated carbon chemical vapor deposition cluster copper coverage crystal crystalline crystallites curves cycle decrease density deposition rate diffusion dislocation dynamics elastic modulus electron epitaxial experimental Figure film growth film thickness films deposited grain growth grown homoepitaxial images in-plane increase interface island laser lattice layer Lett magnetic magnetron Materials Research Society measured mechanism membrane mesophase metal microscopy microstructure molecular dynamics multilayers nanoindentation nanostructures nucleation observed orientation distribution oxide oxygen parameters particles peak phase Phys plasma polycrystalline polymer pressure Proc pulsed quantum dots ratio RHEED samples shown shows silicon simulations SnO2 spectra sputtering structure substrate substrate temperature surface morphology surface roughness Symp thermal thin films thin films deposited tungsten whisker X-ray diffraction ZnO films