Principles of Vapor Deposition of Thin Films (Google eBook)

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Elsevier, Dec 16, 2005 - Technology & Engineering - 1176 pages
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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.

Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
  

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Contents

Chapter 01 INTRODUCTION
1
Chapter 02 EVAPORATION
11
Chapter 03 PLASMA STATE
145
Chapter 04 COLD PLASMA DISCHARGES
259
Chapter 05 THERMAL EVAPORATION SOURCES
367
Chapter 06 GAS FLOW IN THIN FILM PROCESSING SYSTEMS
453
Chapter 07 SPECIAL SOURCES
535
Chapter 08 GAS SOLID INTERACTIONS
619
Chapter 09 NUCLEATION AND GROWTH OF FILMS
685
Chapter 10 EPITAXY
831
Chapter 11 SUBSTRATE PREPARATION
911
Chapter 12 STRUCTURE AND PROPERTIES OF FILMS
961
Chapter 13 DRY ETCHING
1073
Index
1135
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