Photomask and X-ray Mask Technology, Volume 1; Volume 2254

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SPIE, 1994 - Integrated circuits
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Contents

Everincreasing role of mask technology in deep submicrometer lithography Invited Paper
2
New novolakbased positive EB resist EBR900 M1 225405
47
Attenuated phaseshift mask blanks with oxide or oxinitride of Cr or MoSi absorptive shifter
60
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