Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications: 7-8 August 2003, San Diego, California, USA, Volume 5193

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Ali M. Khounsary, Udo Dinger, Kazuya Ota
SPIE, 2004 - Technology & Engineering - 222 pages
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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

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Contents

Fabrication technology of hard xray aspherical mirror optics and application
11
Fabrication and metrology of diffractionlimited soft xray optics for the
18
Fabrication of EUV components with MRF 519303
29
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