Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications: 7-8 August 2003, San Diego, California, USA, Volume 5193
Ali M. Khounsary, Udo Dinger, Kazuya Ota
SPIE, 2004 - Technology & Engineering - 222 pages
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
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Fabrication technology of hard xray aspherical mirror optics and application
Fabrication and metrology of diffractionlimited soft xray optics for the
Fabrication of EUV components with MRF 519303
17 other sections not shown
Advances in Mirror aperture aspheric atomic force microscope beam splitter beamline bimorph Bragg peak calculated Cr/Sc curve density deposition diffraction electrodes equal optical path EUV Lithography EUV reflectance EUVL extreme ultraviolet extreme ultraviolet lithography fabrication figure error film focusing grazing incidence imaging incidence angle interface interferometer ion beam ion beam deposition Kazuya Ota Khounsary laser layer magnetron mask material metrology mirror shells Mo/Si multilayer coatings multilayer mirrors multilayer structure nickel nm rms normal incidence optimized PBMs pencil beam performed period thickness phase shift photomask plasma polishing polyimide Proc radiation ratio replication requirements sample Sc/Si shown in Fig silicon simulation slope error soft x-ray spatial frequency spatial wavelength spectral SPIE SPIE Vol SPring-8 stability sub-aperture sublayer substrate synchrotron temperature thermal thickness gradient Udo Dinger wafer wavefront wavelength wavelength range x-ray mirrors x-ray optics X-ray reflectivity