## Electron-beam sources and charged-particle optics: 10-14 July 1995, San Diego, California |

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### Contents

Retarding field optics with fieldfree sample 252232 | 44 |

Aberration analysis of wideangle deflectors and lenses by direct ray tracing and comparison | 54 |

Dynamic correction of aberrations in focusing and deflection systems with shaped beams | 66 |

Copyright | |

40 other sections not shown

### Common terms and phrases

aberration coefficients accelerating analysis analytical angle angular aperture applied axial beam current Boersch boundary calculated cathode cell charged particle Charged Particle Optics chromatic aberration coil components computed configuration crossover current density deflectors deposition detector distance distortion dynamic corrections electron beam electron beam lithography electron gun electron optical system electrostatic field electrostatic lens emission emittance energy spread equation expert system Figure finite element finite element method focus focused ion beam function Gaussian grid image plane image tube laser lenses lithography low energy magnetic field magnetic lens magnification mask microscope numerical obtained optical properties optimization parameters paraxial photocathode pole-piece potential distribution projection systems pulse quadrupole radiation radius region resolution sample scanning shown in Fig shows silicon simulation space charge space charge effects spherical aberration spot stigmator structure supertip surface symmetric synchrotron technique Technol trajectory voltage wavelength wiggler X-ray