Electron-beam Sources and Charged-particle Optics: 10-14 July 1995, San Diego, CaliforniaEric Munro, Henry P. Freund |
Contents
Electronoptical design for the SCALPEL proofofconcept tool 252202 | 13 |
limitations and enhancements 252203 | 23 |
Thermal field emission sources and optics for Gaussian electronbeam lithography 252204 | 31 |
Copyright | |
43 other sections not shown
Common terms and phrases
aberration coefficients accelerating analysis analytical angle aperture applied axial beam current beam diameter Boersch calculated cathode cell charged particle Charged Particle Optics chromatic aberration coil components computed configuration crossover current density deflectors deposition detector distance distortion dynamic corrections electron beam electron beam lithography electron gun electron optical system electrostatic field electrostatic lens emission emittance energy spread equation expert system Figure finite element finite element method focus focused ion beam function Gaussian grid image plane image tube laser lenses lithography magnetic field magnetic lens magnification main lens mask microscope mrad numerical optical axis optical properties optimization parameters paraxial photocathode pole-piece potential distribution projection systems quadrupole radiation radius region resolution sample scanning shows simulation space charge space charge effects spherical aberration spot stigmator storage ring structure surface symmetric synchrotron Technol trajectory voltage wavelength wiggler X-ray