Charged-particle Optics, Volume 3155

Front Cover
SPIE, 1997 - Electron optics
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Contents

Inlens deflectors for an LVSEM magnetic immersion objective lens 315507
7
Analysis of offaxis shaped beam systems for highthroughput electronbeam lithography
47
fast approximate calculation of the imaging
70
Nature of distortions of the surface pattern produced by precise electronbeam processing
78
a surprising and simple solution
89
ELECTRON AND ION LITHOGRAPHY EBEAM TESTING AND ELECTRON MICROSCOPES
145
Miniature scanning electron microscope design based upon the use of permanent magnets
175
ACCELERATORS CURVED AXIS SYSTEMS AND MULTIPOLE LENSES
185
Computer analysis of imaging energy filters 315520
193
Influence of the rod diameter of electrostatic quadrupole lenses on the axial field
205
Spherical aberration correction of a focused ion beam with space charge 31 5524
216
Influence of perturbations at distortion and tolerances with regard to their corrections
228
Modern numerical techniques and software for photo and thermoemission electron optical
241
Some models and codes in imaging and highcurrent electron optics 315527
248
Addendum
265
Copyright

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