Japanese Journal of Applied Physics: Regular papers & short notes. Part 1, Volume 42, Issues 3-4

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Publication Board, Japanese Journal of Applied Physics, 2003 - Engineering
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Contents

CONTENTS
1119
Bipolar Structure in Thermally Treated Czochralski Silicon Wafer 1129 Xuegong Yu Deren Yang Xiangyang Ma Ruixin
1129
Low Temperature Nitridation of Si Oxide Utilizing Activated Oxygen and 1145 Yukiharu Uraoka Hiroshi Yano Tomoaki
1145
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