88 pages matching angle in this book
Results 1-3 of 88
What people are saying - Write a review
We haven't found any reviews in the usual places.
Bipolar Structure in Thermally Treated Czochralski Silicon Wafer 1129 Xuegong Yu Deren Yang Xiangyang Ma Ruixin
Low Temperature Nitridation of Si Oxide Utilizing Activated Oxygen and 1145 Yukiharu Uraoka Hiroshi Yano Tomoaki
54 other sections not shown
2003 The Japan absorption accepted for publication angle annealing Appl Applied Physics atoms backward-difference band gap beam Bloch wall BST thin films capacitance carbon cell ceramics chemical CNTs color removal concentration crystal crystalline decreases density deposition devices diameter dielectric constant diffraction diffusion diodes doped effect electric field electron energy etch rate etching experimental fabricated ferroelectric fiber laser Figure film thickness flow rate function increase interface irradiation Japan Society laser diode layer Lett magnetic measured method microactuator MWNTs nanowires Newton's iteration observed obtained optical oxide oxygen particles peak phase photon photoresist Phys piezoelectric plasma polarization polymer pulse PZT film ratio refractive index region sample sheet resistance shown in Fig shows signal silicon sintered Society of Applied specimens spectra spectroscopy stress structure substrate surface Technol temperature thermal velocity vibration voltage wafers wavelength X-ray YBCO