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A Monastyrsky V A Tarasov General Physics Institute Russia A M Filachev
Improved resolution in fieldemission lithography machines 28581
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accuracy analytical angle axial field functions basic surfaces boundary calculated cathode cathode tip Charged Particle Optics coefficient matrix element coil column combined field lens components computation conformal mesh Coulomb interactions crossover mode crossover-limiting aperture cylindrical D2 aperture deflection deflectors detector dtot effects electric field electron beam lithography electron gun electron trajectories electrostatic emission emitter emitting energy equation error field distribution finite element method focussed ion beam FOFEM and SOFEM geometry hermite cubic image rotation integral Laplace polynomial expansion Laplace's equation Lencova magnetic field magnetic lens magnification mesh cell mesh layout mesh nodes mesh points mesh step numerical objective lens obtained off-axial position optical axis optical properties parameters pencil of rays plane POCAD point cathode pole-piece polynomial expansion potential distribution probe current quadrupole radial gap lens ray tracing region secondary electron shown in Figure shows space charge specimen symmetric voltage wehnelt Wien filter