Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin FilmsChemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films. |
Contents
STEPBYSTEP GUIDE TO DEPOSITING PARYLENE | 3 |
DEPOSITION EQUIPMENT 9 | 8 |
3 | 41 |
FILM PROPERTIES | 57 |
OTHER CVD POLYMERS | 83 |
Other editions - View all
Chemical Vapor Deposition Polymerization: The Growth and Properties of ... Jeffrey B. Fortin,Toh-Ming Lu No preview available - 2010 |
Chemical Vapor Deposition Polymerization: The Growth and Properties of ... Jeffrey B. Fortin,Toh-Ming Lu No preview available - 2013 |
Common terms and phrases
104 amu peak adsorption annealing applications as-deposited base pressure calculated CH₂ CH₂ chain end chamber pressure chemical vapor deposition chemisorption Chemisorption model coating cold trap contamination CVD process depo deposition chamber deposition of parylene deposition process deposition rate dielectric constant diffusion pump dimer diradical dissipation factor electron energy example deposition system experimental film thickness flow rate fluorinated fragmentation pattern function Gorham growth rate heated increase initiation kinetics mass spectrometer material molecule monomer monometer NIST nm/min p-xylene para-xylylene parameters parylene family polymers parylene films parylene thin films parylene-N percent physisorption plasma Plasma polymerized poly polymer film polynaphthalene film precursor produced properties pump speed pyrolysis pyrolysis furnace pyrolysis temperature pyrolysis zone reactant reaction reactor shown in figure sition solvent sticking coefficient structure studied sublimation furnace sublimation tube substrate substrate temperature surface techniques Teflon Teflon-AF thermal stability thermocouple typical vacuum valve versus volatile wafer