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DEFECT DENSITY MANAGEMENT
Vibration on Various Floor Types in Microelectronic Fabrication Facilities
Defect Engineering Harold D Fitch IBM Corporation Essex Junction VT
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9th ICCCS Proceedings aerosol air flow airborne particles analysis bacteria calculated chamber charge chemical Class clean room cleanliness contamination control counter density deposition velocity detection developed device diaphragm valve diffusion distribution dust effect efficiency electric field electronics electrostatic Engineering environment experimental facility factor Figure filtration floor garment gases HEPA filter high purity ICCCS Proceedings 1988 impurities increase industry installation ionization laminar flow laser manufacturing materials measured mechanical method micron monitoring number of particles operation orifice outgassing parameter particle concentration particle contamination particle counts particle deposition particle diameter personnel pipe piping materials ppb max pressure procedures process equipment PVDF reduced sampling semiconductor shown shows SMIF stainless steel supply surfactants Table techniques temperature thermal tion Tohoku University tube turbulence ULPA ultra clean ultrapure water unit vertical voltage wafer surface wear