ALT '94 International Conference: laser methods of surface treatment and modification : 5-9 September 1994, Konstanz, Germany
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Laser surface processing of thin films for microelectronics applications 249801
Practical excimerlaserassisted cleaning of solid surfaces 249804
Optical probing of the temperature and pressure transients at a liquidsolid interface due
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acoustic amplifiers Appl atoms bubbles calculated cavity centers ceramic chemical cleaning cycles coefficient concentration cross section crystalline density dependence doped electron emission etching excimer laser excited state absorption experimental Fiber Laser fluorescence fluoride fluoride crystals intensity interaction intracavity investigated ions Judd-Ofelt laser beam laser cleaning laser fluence laser irradiation laser processing laser pulse laser pumped laser radiation layer lens Lett line strengths liquid luminescence materials mbar measured melt metal method molecules Moscow Nd:YAG laser NdF3 neodymium obtained optical oscillation output coupler output mirror parameters particles passively Q-switched peak phase Phys pressure probe properties pulse duration pulse energy pump laser Q-switched Raman laser reflectance region sample saturable absorbers shown in Fig signal silica silica glass slope efficiency solid solutions solid-state lasers spectra spectroscopy spectrum SrF2 Stokes structure studied substrate superconducting surface symmetry target technique temperature thermal thin films transition vaporization velocity wavelength ZBLAN