Advances in materials problem solving with the electron microscope: symposium held November 30-December 3, 1999, Boston, Massachusetts, U.S.A.
This volume was motivated by the remarkable advances that continue to be made in electron microscope instrumentation and techniques for applications to materials science. Characterization problems can now be tackled that were beyond reach just a few years ago. Advances include quantitative high-resolution imaging, atomic-resolution Z-contrast imaging, elemental mapping by energy-filtered TEM or spectrum imaging, atomic-resolution EELS for composition and bonding, quantitative CBED, site-occupancy determination by ALCHEMI, electron holography, EBSP in the SEM for phase identification and orientation imaging microscopy, low-voltage microanalysis of bulk specimens, and "in situ experiments of dynamic phenomena. In particular, the volume emphasizes how these recent developments in electron microscopy are being used to solve materials problems. It features different groups of materials or microstructural components rather than electron microscope techniques or instrumentation. Papers focus on low-energy electron microscopy of surfaces, crystallography, defects, specimen preparation, and interfaces in metals and ceramics. Technological applications include magnetic materials, microelectronic materials, partially ordered and nanophase materials, polymers, ceramics, metallic alloys, concrete, biomaterials, and glasses.
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Microstructural Characterization of Longitudinal Magnetic
Electron Holography of Nanostructured Magnetic Materials
Flux Mapping and Magnetic Behavior of Grain Boundaries in NdFeB
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alloy analysis angle annealing apertures atomic bulk carbon nanotubes catalyst CBED chemical column composition contrast crystal defects density deposition detector determined diffraction diffusion dislocations distribution EBSD EBSD patterns edge EELS effects electron beam electron diffraction elements energy loss epitaxial experimental facets field emission Figure formation grain boundary high-resolution HOLZ HREM HRTEM hydrogen in-situ increase intensity interface intermetallic irradiation ISBN JEOL lattice layer magnetic maps Materials Science measured metal microanalysis microcracks microstructure nanoparticles nucleation observed obtained orientation oxide oxygen parameters particles peak phase Phys plane positions precipitates pressure probe profiles region sample scanning Scanning Electron Microscopy scattering segregation shown in Fig shows silicon simulated spatial resolution specimen spectra spectroscopy spectrum line splat STEM structure substrate surface SWNTs techniques temperature tetragonal thermal thickness thin films tilt TiO2 torr transmission electron microscopy Ultramicroscopy unit cell voltage X-ray yttrium Z-contrast image