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The thin film MIS surface photodiode
Study of metalorganic monolayersemiconductor structures
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aluminum annealing anode Appl Application of Thin atoms beam bolometer bulk calculated capacitance capacitors cathode ceramic cermet characteristics coefficient composition conductivity Conference on Thin curves density dependence deposition rate detector developed devices dielectric diffusion diode effect electrical electromigration electron ellipsometric Ellipsometry energy epitaxial evaporation experimental ferroelectric field film thickness films deposited filters frequency function germanium glass heat image intensifier increase insulator interface International Conference Italy laser layer light materials matrix measured metal films method multilayer observed obtained oxide Paper presented parameters photoconductive photographic photopotential Phys platinum silicides polarization pulse pyroelectric range ratio Received May 18 reflectance refractive index region resistivity samples scattering semiconductor sensitivity shown in Fig shows silicon silver halides SiO2 Sputter deposition structure substrate substrate temperature surface target techniques thermal Thin Films torr transmission trapping vacuum vacuum deposition values vapour Venice voltage wavelength