Applications of synchrotron radiation techniques to materials science: symposium held April 12-15, 1993, San Francisco, California, U.S.A., Volume 1
Absorption spectroscopy: extended fine structure; Absorption spectroscopy: near-edge structure; Structure of surfaces, interfaces, films, and multilayers; Electronic structure; Topography, tomography, microscopy, and materials imaging; X-ray scattering/crystallography and instrumentation.
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AB INITIO XAFS AND XANES STANDARDS
CHARACTERIZATION OF NANOSCALE OXIDE
A NEW TECHNIQUE
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1993 Materials Research amorphous amplitude angle annealed atoms band beam beamline binding energy bond boundary bulk Burgers vector calculations chrysocolla CjHjNiNO contrast coordination core level crystalline cubic Debye-Waller factor decrease defects detector dioptase distances dopants edge electron emission EXAFS experimental Fermi Figure film fluorescence Fourier transform glass growth indicate indium intensity interface inversion twin K-edge L-edge lattice Lett magnetic Materials Research Society measured metal method neighbor NEXAFS normal NSLS observed obtained orientation oxide oxygen parameters peak phase photoelectron photoemission photoexcited photon Phys plane polymer powder Proc region resolution room temperature sample scattering screw dislocations shell shown in Fig shows silicon single crystal solid spectra spectroscopy spectrum structure substrate surface Symp Synchrotron Light Synchrotron Radiation technique tetragonal thermal transition valence valence band vector wafer X-ray absorption X-ray diffraction X-ray topographs XAFS XANES