Capture Pumping Technology: An Introduction
Capture Pumping Technology: An Introduction is a practical book for students, technicians, scientists and engineers involved in the field. The author has drawn upon his vast experience in vacuum-related technologies to provide an introduction to the fundamentals of the subject. The book is written in an easy-to-read style based on a one-to-one discussion, and offers a selection of common problems at the end of each chapter. With chapters on basic theory, sputter-ion pumping, titanium sublimation pumping, nonevaporable getters, and cryopumping, the book makes an excellent introductory text.
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TITANIUM SUBLIMATION PUMPING
NONEVAPORABLE GETTERS NEG
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101 material 707 material adsorption alloy anode aperture applications argon Assume atoms AVS Symp beam calculations capacity cathode material chamber chemisorption chevron compressor conductance configuration Cong constant cooled cryocondensation Cryogenic cryopanel cryopump cryosorption pumping decrease density diffusion diffusion pump diode diode pump effect electrical electron energy equation equilibrium pressure example Figure filament film flux function gas molecule gases gauge Getter heat Helium high pressure hydrogen increase Ion Pump ionization Jepsen low pressures magnetic field manifold metal molecular noble gas noted operating outgassing partial pressure physisorption problem Proc pumping speed refrigeration regeneration reported roughing pump second stage shown in Fig sieve material sorbed sorption pumps space charge speed measurements sputter-ion pumps sputtering sticking coefficient sublimation rate sublimed films surface area Technol temperature thermal throughput Titanium Torr triode pump TSP pumping tube U.S. Patent vacuum system valve vapor pressure Varian volume