Chemical Vapor Deposition

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Jong-Hee Park, T. S. Sudarshan
ASM International, 2001 - Technology & Engineering - 481 pages
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Contents

Introduction to Chemical Vapor Deposition CVD
1
Basic Principles of CVD Thermodynamics and Kinetics
23
Stresses and Mechanical Stability of CVD Thin Films
45
Combustion Chemical Vapor Deposition CCVD
81
Polarized Electrochemical Vapor Deposition
103
Chemical Vapor Infiltration Optimization of Processing Conditions
183
MetalOrganic Chemical Vapor Deposition of High Dielectric Ba Sr TiO₃Thin Films for Dynamic Random Access Memory Applications
205
Chemical Vapor Deposition of Polymers Principles Materials and Applications
243
CVD Diamond DiamondLike Carbon and Carbonitride Coatings
331
CVD Diamond Films in Tribological Applications
379
CVD Films for Electrical Insulation
401
CVD Films for Corrosion Protection Coatings
421
Heat Treatment of CVDCoated Tool Steels
435
Subject Index
465
Author Index
481
Copyright

CVD of Metals The Case of Nickel
287

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Page 21 - Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy.
Page 21 - This work was performed under the auspices of the Division of Materials Science of the Office of Basic Energy Sciences, US Department of Energy, and the Lawrence Livermore National Laboratory under contract No.
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