Data Quality: The Accuracy Dimension

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Elsevier, Jan 9, 2003 - Computers - 300 pages
2 Reviews
Data Quality: The Accuracy Dimension is about assessing the quality of corporate data and improving its accuracy using the data profiling method. Corporate data is increasingly important as companies continue to find new ways to use it. Likewise, improving the accuracy of data in information systems is fast becoming a major goal as companies realize how much it affects their bottom line. Data profiling is a new technology that supports and enhances the accuracy of databases throughout major IT shops. Jack Olson explains data profiling and shows how it fits into the larger picture of data quality.

* Provides an accessible, enjoyable introduction to the subject of data accuracy, peppered with real-world anecdotes.

* Provides a framework for data profiling with a discussion of analytical tools appropriate for assessing data accuracy.

* Is written by one of the original developers of data profiling technology.

* Is a must-read for any data management staff, IT management staff, and CIOs of companies with data assets.

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Implementing a Data Quality Assurance Program
Data Profiling Technology
Appendix A Examples of Column Properties Data Structure Data Rules and Value Rules
Appendix B Content of a Data Profiling Repository
About the Author

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Page 10 - With the growing availability of knowledge, experts, books, methodologies, software tools, and corporate resolve, high-quality database systems will become the norm, and there will be no excuse for not having them.
Page viii - I must admit that when I was approached to write the foreword for this book, I had some reservations.

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About the author (2003)

Jack E. Olson is a widely recognized database technology expert. His career includes significant contributions at IBM, BMC, Evoke, and now NEON Enterprise Software, where he serves as Chief Technology Office. Olson is author of Data Quality: The Accuracy Dimension, also published by Morgan Kaufmann. The inventor of record on several patents, he holds a BS from the Illinois Institute of Technology and an MBA from Northwestern University.

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