Database Needs for Modeling and Simulation of Plasma Processing

Front Cover

In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

 

What people are saying - Write a review

We haven't found any reviews in the usual places.

Contents

Executive Summary
1
1 Industrial Perspectives
5
2 Tool Scale and Feature Scale Models
13
3 Radiative Processes and Diagnostics
23
4 Heterogeneous Processes
33
5 Electron Collision Processes
41
6 Ion Processes Neutral Chemistry And Thermochemical Data
47
Acronyms and Abbreviations
59
Workshop Agenda
61
Workshop Participants
63
Copyright

Other editions - View all

Common terms and phrases

Popular passages

Page ii - This research was supported in part by the Defense Advanced Research Projects Agency and the Office of Naval Research...
Page viii - Plasma Science: From Fundamental Research to Technological Applications, National Academy Press, Washington, DC, 1995, pp.
Page 39 - K. Ono, T. Oomori, M. Tuda, and K. Namba, J. Vac. Sci. Technol.

Bibliographic information