Diffractive and holographic technologies for integrated photonic systems: 22-23 January 2001, San Jose, USA
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THEORY DESIGNS AND NOVEL PROCESSES
Modified integral method and real electromagnetic properties of echelles 429102
DIFFRACTIVEHOLOGRAPHIC DEVICES AND SYSTEMS
10 other sections not shown
absolute efficiency amplitude aperture applications approximately axis beam splitter Bessel beam blazed grating calculated coefficient continuous-relief convergence developed device diffraction efficiency Diffractive and Holographic diffractive micro-optical element diffractive optical elements dynamic range echelle electromagnetic Electron equation ESBG etalon etching experimental fabrication parameters ferroelectric ferroelectric molecule filter finesse function Gaussian beam genetic algorithms Goray gr/mm Green's function groove profile holograms Holographic Technologies input integral method laser intensity lens Lett linear liquid crystal lithography matrix measured micron multilevel multimode fiber obtained optical fibers optimization output pattern performance phase modulation phase shift phase-only photoresist Phys pixel plane propagation ratio refractive index rotation scalar semiconductor lasers shown in figure simulation single mode fiber skew rays spatial light modulators speckle SPIE Vol storage structure substrate surface surface-relief profile technique TM polarization VCSEL vector vertical voltage wave waveguide wavelength