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THE SCANNING TRANSMISSION ELECTRON MICROSCOPE
Field Emission Source
12 other sections not shown
50 nm thick aberration absorbed energy density Adesida Alec Broers AlF3 atom beam exposure bright field micrograph bright field signal coul/cm2 current density diameter diffraction diffusion displacement e-beam electron beam Electron Beam Lithography energy loss spectra evaporated exciton exposed Exposure distribution function fabricated FF 00 FF field emission FORMAT FORMAT FORMAT high resolution holes incident electron inelastic interaction ion beam lithography irradiated region Isaacson lattice Lett linewidth mask mass loss mean free path measured mechanism metal halides MgF2 microcomputer micron Monte Carlo calculations Muray NaCl NaCl crystal NANOLITHOGRAPHY nanometer occurs Optical pattern peak photolithography Phys plasma loss plasmon plotted PMMA probe Reactive Ion Etching replicated resolution limits sample scan scattering Scheinfein secondary electrons selected area selected area diffraction shown in Figure silicon specimen spectrometer STEM stepper motors surface Technol thick PMMA thin film substrates Tiny Basic Tracor unblank