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High resolution imaging and diffraction studies of crystal surfaces
Reducing electron irradiation damages I
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aberration accelerating voltage alloys analysis angle aperture application astigmatism atomic axis backscattered bright calculated cathode cathodoluminescence CBED chromatic aberration coefficients contrast crystal defocus density detection detector determined diameter diffraction pattern dislocations electron beam electron diffraction electron microscopy energy loss experimental field emission field emission gun Fig.l Figure film Fourier fringes function GaAs grain boundary high resolution electron HOLZ HREM image processing incident intensity interface Japan lattice images layer magnetic measured metal method microanalysis micrograph microscope mode objective lens observed obtained optical parameters particles peak phase Phys plane position probe quasicrystal ratio reflections region sample scanning electron scanning electron microscope scattering secondary electron shown in Fig shows signal space group spatial specimen spectra spherical aberration spot structure substrate surface symmetry technique temperature thickness thin tilt tion Tokyo transmission electron microscope Ultramicroscopy values voltage waveform X-ray