Electron optical systems for microscopy, microanalysis & microlithography: proceedings of the 3rd Pfefferkorn Conference, held April 9 to 14, 1984, at the Carousel Hotel, Ocean City, MD
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MAGNETIC ELECTRON LENSES
VARIOUS ATTEMPTS TO REDUCE THE DIMENSIONS OF MAGNETIC ELECTRON LENSES USED FOR HIGH
ELECTROSTATIC AND MAGNETIC IMAGING WITHOUT IMAGE ROTATION
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aberration coefficient aberration theory angle angular anode aperture approximation Auger axial axis backscattered electron beam current boundary brightness calculated capacitor chromatic aberration coil convergence crystal current density curve diameter diffraction display effect elec electric electron gun electron optical electron optical systems electrostatic electrostatic lens emitter emitting equation experimental field distribution field emission gun Figure flux focal length function geometry high resolution increase integral LaB6 LaBg lanthanum hexaboride limited linear magnetic field magnetic lens magnification mesh method micro-flat micrographs objective lens obtained operating Optik optimization parameters paraxial Phys plane pole pieces potential principal trajectory problem Proc projector quadrupole radius region sample scanning electron microscope secondary electron shown in Fig signal simulation solution space charge specimen spherical aberration structure superconducting symmetric techniques temperature thermionic thermionic emission tilt tion vacuum values voltage Wehnelt wide electron beam yoke