Laser photoionization and desorption surface analysis techniques: 18-19 January 1990, Los Angeles, California
SPIE, 1990 - Technology & Engineering - 176 pages
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SURFACE KINETICS AND MECHANISMS
2 other sections not shown
ablation laser adsorbed adsorption anisotropic anisotropic SH annealed Auger azimuthal angle bonding branching ratio Chem chemisorption core coverage crystal Cu(l decomposition desorbed desorption detection deuterium dissociation distribution DMCd dopant dye laser dynamics electronic excitation experimental experiments Figure fluence frequency FTIR function gas phase heating rate increase induced infrared ionising laser ionization LAMMS laser ablation laser beam laser fluence laser irradiation laser pulse lateral diffusion Lett LITD signal mass spectrometer measured methyl molecular molecules monolayer neutrals observed optical fibers overlayer peak photon Phys polarization probe propylene Pt(lll pump reaction intermediates relaxation REMPI repetition rate resonant ionisation rotational rotationally anisotropic S.M. George sample scattering second harmonic sensitivity SH intensity SH response silicon surface species spectra spectroscopy sputtering stretching mode studies substrate Surf surface temperature TaSi2 technique temperature dependence thermal desorption transient transition velocity vibrational Vibrational energy relaxation wavelength