Lithographic and Micromachining Techniques for Optical Component Fabrication: 29-30 July 2001, San Diego, USA, Volume 4440
SPIE, 2001 - Technology & Engineering - 324 pages
What people are saying - Write a review
We haven't found any reviews in the usual places.
Thick refractive beam shaping elements applied to laser diodes 444003
18 other sections not shown
Other editions - View all
aberrations accuracy alignment angle applications aspheric surfaces axis beam power beam shaping elements BPSG calculated collimation confocal coordinate cylindrical diameter diffraction efficiency diffraction gratings diffractive optical elements e-beam electron beam electron beam lithography energy etching exposure fiber film focal Fresnel lens function fused silica glass grating period gray-scale holograms illumination intensity distribution interference lithography interferometer Kley laser beam laser writing layer LDW-glass lens lenses light lithography simulation manufacturing mask material measured method micro micro-optics microlenses Micromachining modeling numerical aperture Optical Component Fabrication parameters pattern phase photolithography photonic crystal photoresist pixel plane polarization polymer Proc pulse radial radius ratio reflow refractive replication resist rotation sample scanning semiconductor Shack-Hartmann shown in Figure shows silicon spatial SPIE Vol structures substrate subwavelength Techniques for Optical thickness tool transmittance VCSEL vector wafer wave wavefront wavelength