Magnetic and electronic films: microstructure, texture, and application to data storage : symposia held April 1-4, 2002, San Francisco, California, U.S.A.

Front Cover
Patrick W. DeHaven
Materials Research Society, Aug 2, 2002 - Computers - 306 pages
This volume brings together two symposia from the 2002 MRS Spring Meeting in San Francisco to provide an interdisciplinary discussion of magnetic and electronic films. The importance of new materials in magnetic data storage is underlined by the accelerating pace of real density growth, which for the last five years has exceeded 100% per annum. Symposium E, "Nanostructural Magnetic Materials for Data Storage, covers a wide range of novel materials with datastorage potential, as well as the latest research in more conventional materials for head and media applications. In particular, new work on lithographically-defined nano-structures and nanowires shows exciting possibilities for the future, including patterned media and magnetic logic operations. New work on chemical methods to produce ferromagnetic particles less than 10nm in diameter, with extremely narrow size distributions, indicates that this area is very promising, but that additional research is needed. Presentations from Symposium J,"Texture and Microstructure in Electronic and Magnetic Films, reflect the growing interest in textural and microstructural control in thin-film technology. Materials systems in which links between crystallographic texture, microstructure and properties are studied include metal films (with particular emphasis on copper), electronic films including ferro-electrics, and transparent conducting oxides. Presentations display a significant variation in the sophistication of texture-measurement techniques, depending on application and equipment availability. The technique of electron backscatter diffraction (EBSD), which yields spatially specific information on texture, microstructure and microtexture,is strongly featured. Recent advances in characterization techniques, novel applications

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Crystallographic Texture and Phase Metrology During
Accuracy and Reproducibility of Xray Texture Measurements
An In Situ ObliqueIncidence Optical Reflectance Difference

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