Measurement techniques for thin films
Electronics Division and Dielectrics and Insulation Division, Electrochemical Society, 1967 - Science - 364 pages
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Surface Measurements Using Low Energy Electron
A Special Method of Pole Figure Analysis of CdS Films
14 other sections not shown
absorption aluminum analysis angle of incidence Appl applied argon atoms band barrier bulk calculated carbon coatings contrast copper crystallites curve density deposited detected determined diffraction beams diffraction pattern dislocations effect electrical Electrochem electron diffraction Electron Microscopy ellipsometer energy epitaxial epitaxial layers evaporated film thickness frequency fringe spacing function fused glass films impurities infrared instrument insulator intensity interface interferometry light limited magnification mass spectrometer material metal films micrograms micrograph microns microscope Minimum measurable thickness nitrogen Nondestructive Nondestructive test normal obtained optical flat oxide films oxygen Phys piezoelectric polarizers probe produce properties Pyrex quartz reciprocal lattice reflection refractive index sample semiconductor sensitivity shown in Fig silicon single crystal solid spark source spectra spectrum spreading resistance structure studies substrate surface tantalum films technique temperature thermal thickness measurement thin films thinner films tion Tolansky method transmission tunneling vacuum values voltage wave plate wavelength X-ray