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High Performance Single Layer Resist Systems
Optical Single Layer Liftoff Process
Design of Contrast Enhancement Processes
56 other sections not shown
1985 by Academic aberrations absorber Academic Press London angle aperture application backscattered beam current cathode chip chromatic aberration contrast current density deflection deposited detector devices distortion dose dry development e-beam edge electron beam lithography emission etch rate exposed exposure fabrication field Figure film filter focused ion beam form reserved frequency grid Invar ion beam irradiation lens lift-off linewidth magnetic measured membrane MICROCIRCUIT ENGINEERING Copyright micrograph microns microwave plasma obtained optical oxygen pads parameters photoresist plasma PMMA polyimide polymer position Press London ISBN produce proximity effect radiation reduced resist pattern resist system rights of reproduction scanning electron scanning electron microscope secondary electron sensitivity shown in Fig shows signal silicon simulation stress structure submicron substrate surface synchrotron radiation technique Technol temperature tensile stress thermal thickness throughput tion voltage wafer wavelength width X-ray lithography X-ray mask